By Larry F. Thompson, C. Grant Willson, Seiichi Tagawa
content material: Chemical amplification mechanisms for microlithography / E. Reichmanis, F.M. Houlihan, O. Nalamasu, and T.X. Neenan --
Synthesis of 4-(tert-butoxycarbonyl)-2,6-dinitrobenzyl tosylate : a possible generator and dissolution inhibitor solubilizable via chemical amplification / F.M. Houlihan, E. Chin, O. Nalamasu, and J.M. Kometani --
Chemically amplified deep-UV photoresists in response to acetal-protected poly(vinylphenols) / Ying Jiang and David R. Bassett --
Novel analytic approach to photoinduced acid new release and facts of photosensitization through matrix resin / N. Takeyama, Y. Ueda, T. Kusumoto, H. Ueki, and M. Hanabata --
Acid-catalyzed dehydration : a brand new mechanism for chemically amplified lithographic imaging / H. Ito, Y. Maekawa, R. Sooriyakumaran, and E.A. Mash --
An alkaline-developable optimistic withstand in accordance with silylated polyhydroxystyrene for KrF excimer laser lithography / Eiichi Kobayashi, Makoto Murata, Mikio Yamachika, Yasutaka Kobayashi, Yoshiji Yumoto, and Takao Miura --
A try for correlation among residual solvent and charges of N-methylpyrrolidone absorption via polymer motion pictures / W.D. Hinsberg, S.A. MacDonald, C.D. Snyder, H. Ito, and R.D. Allen --
Dissolution charges of copolymers in line with 4-hydroxystyrene and styrene / C.-P. Lei, T. lengthy, S.K. Obendorf, and F. Rodriguez --
Synthesis and polymerizations of N-(tert-butoxy)maleimide and alertness of its polymers as a chemical amplification withstand / Kwang-Duk Ahn and Deok-Il Koo --
Acid-sensitive pyrimidine polymers for chemical amplification resists / Yoshiaki Inaki, Nobuo Matsumura, and Kiichi Takemoto --
Methacrylate terpolymer technique within the layout of a relations of chemically amplified optimistic resists / R.D. Allen, G.M. Wallraff, W.D. Hinsberg, L.L. Simpson, and R.R. Kunz --
Surface-imaging resists utilizing photogenerated acid-catalyzed SiO₂ formation by way of chemical vapor deposition / Masamitsu Shirai and Masahiro Tsunooka --
Polysilphenylenesiloxane face up to with three-d constitution / okay. Watanabe, E. Yano, T. Namiki, and Y. Yoneda --
Top-surface imaging utilizing selective electroless metallization of patterned monolayer movies / J.M. Calvert, W.J. Dressick, C.S. Dulcey, M.S. Chen, J.H. Georger, D.A. Stenger, T.S. Koloski, and G.S. Calabrese --
Langmuir-Blodgett deposition to judge dissolution habit of multicomponent resists / V. Rao, W.D. Hinsberg, C.W. Frank, and R.F.W. Pease --
Photochemical keep an eye on of a morphology and solubility transformation in poly(vinyl alcohol) movies brought on through interfacial touch with siloxanes and phenol-formaldehyde polymeric photoresists / James R. Sheats --
Advances within the chemistry of resists for ionizing radiation / Ralph Dammel --
Out-of-plane enlargement measurements in polyimide movies / Michael T. Pottiger and John C. Coburn --
Radiation-induced adjustments of allylamino-substituted polyphosphazenes / M.F. Welker, H.R. Allcock, G.L. Grune, R.T. Chern, and V.T. Stannett --
Synthesis of perfluorinated polyimides for optical functions / Shinji Ando, Tohru Matsuura, and Shigekuni Sasaki --
Charged species in [sigma]-conjugated polysilanes as studied by means of absorption spectroscopy with low-temperature matrices / okay. Ushida, A. Kira, S. Tagawa, Y. Yoshida, and H. Shibata --
Acid-sensitive phenol-formaldehyde polymeric resists / W. Brunsvold, W. Conley, W. Montgomery, and W. Moreau --
Superiority of bis(perfluorophenyl) azides over nonfluorinated analogues as cross-linkers in polystyrene-based deep-UV resists / Sui Xiong Cai, M.N. Wybourne, and John F.W. Keana --
New photoresponsive polymers bearing norbornadiene moiety : synthesis by way of selective cationic polymerization of 2-(3-phenyl-2,5-norbornadiene-2-carbonyloxy)ethyl vinyl ether and photochemical response of the ensuing polymers / T. Nishikubo, A. Kameyama, okay. Kishi, and C. Hijikata --
Photoinitiated thermolysis of poly(5-norbornene 2,3-dicarboxylates) : how to polyconjugated platforms and photoresists / Ernst Zenkl, Michael Schimetta, and Franz Stelzer --
fresh development of the applying of polyimides to microelectronics / Daisuke Makino --
Base-catalyzed cyclization of ortho-aromatic amide alkyl esters : a singular method of chemical imidization / W. Volksen, T. Pascal, J.W. Labadie, and M.I. Sanchez --
Base-catalyzed photosensitive polyimide / D.R. McKean, G.M. Wallraff, W. Volksen, N.P. Hacker, M.I. Sanchez, and J.W. Labadie --
Novel cross-linking reagents according to 3,3-dimethyl-1-phenylenetriazene / Aldrich N.K. Lau and Lanchi P. Vo --
education of novel photosensitive polyimide platforms through long-lived lively intermediates / Takahi Yamashita and Kazuyuki Horie --
Photoregulation of liquid-crystalline orientation by way of anisotropic photochromism of floor azobenzenes / Yuji Kawanishi, Takashi Tamaki, and Kunihiro Ichimura --
elements affecting the soundness of polypyrrole movies at larger temperatures / V.-T. Truong and B.C. Ennis --
Intrinsic and thermal pressure in polyimide skinny motion pictures / M. Ree and D.P. Kirby --
Fluorinated, soluble polyimides with excessive glass-transition temperatures in accordance with a brand new, inflexible, pentacyclic dianhydride : 12,14-diphenyl-12,14-bis-(trifluoromethyl)-12H,14H-5,7-dioxapentacene-2,3,9,10-tetracarboxylic dianhydride / Brian C. Auman and Swiatoslaw Trofimenko --
Processable fluorinated acrylic resins with low dielectric constants / Henry S.-W. Hu and James R. Griffith --
more desirable processing of poly(tetrafluoroethylene) for microelectronics purposes / Charles R. Davis and Frank D. Egitto --
Fluorinated poly(arylene ethers) with low dielectric constants / Frank W. Mercer, David W. Duff, Timothy D. Goodman, and Janusz B. Wojtowicz --
Microstructural characterization of skinny polyimide movies through positron lifetime spectroscopy / A. Eftekhari, A.K. St. Clair, D.M. Stoakley, Danny R. Sprinkle, and J.J. Singh --
Synthesis and characterization of latest poly(arylene ether oxadiazoles) / Frank W. Mercer, Chris Coffin, and David W. Duff.
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Additional info for Polymers for Microelectronics. Resists and Dielectrics
Houlihan, E. Chin, O. Nalamasu, and J . M . Kometani AT&T Bell Laboratories, Murray Hill, NJ 07974 A simple synthetic pathway was devised for 4-(t-butoxycarbonyl)-2,6-dinitrobenzyltosylate 1 startingfrominexpensive 3,5-dinitrotoluic acid. This molecule incorporates both the o-nitrobenzylsulfonate moiety needed for a photogenerator of acid (PAG) and the t-butoxycarbonyl moiety needed for a dissolution inhibitor solubilizable by chemical amplification (DISCA). Preliminary evalua tions show that the thermal stability of 1 towards thermal elimination of isobutene is almost identical to that of 2,6-dinitrobenzyl tosylate in a matrix containing t-butoxycarbonyl moieties (~160 °C).
Crivello, J. ; Lee, J. ; Conlon, D. ; Makromol. , Makromol. , 1988, 13/14, p. 145. ; ACS Symposium Series; American Chemical Society: Washington, DC, 1993. ch004 N. Takeyama, Y. Ueda, T. Kusumoto, H. Ueki, and M . , Osaka Research Laboratory, 3-1-98, Kasugadenaka, Konohana-ku, Osaka City, Osaka 554, Japan A novel analytic method of photoinduced acid generation was developed by which the relative efficiency of photoinduced acid generation can be easily determined. For one halogenated photoacid generator, a photosensitization mechanism via matrix resin was suggested.
The reaction mixture was left stirring for 2 h. 0 mL). The organic layer was then filtered through a short column of silica gel, dried over MgS0 and stripped of solvents under vacuum to give crude material. ; ACS Symposium Series; American Chemical Society: Washington, DC, 1993. 0 mL of hot ethanol and allowed to cool. A small amount of black tar-like material deposited in the flask was removed by decanting. The solution was recrystallized by adding a small amount of water and cooling to 10 °C.